|
Time
|
Topic
|
Speaker
|
|
09:00-09:10
|
Open remark
|
Dr. Yu-Ping Lan, Director, CMS/ITRI
|
|
Session I Advanced Metrology for Future Microelectronics Manufacturing
|
|
09:10-09:35
|
CD-SAXS for Critical Dimension Measurement in Advanced Semiconductors
|
Dr. R Joseph Kline, NIST
|
|
09:35-10:00
|
Defect Classification and Composition Study by Photoluminescence in Compound Semiconductor & 2D materials
|
Kosuke Matsumoto, HORIBA
|
|
10:00-10:25
|
The Development of Advanced Electron Microscopy in ITRI: What’s the Next Step?
|
Dr. Shen-Chuan Lo, CMS/ITRI
|
|
10:25-10:45
|
Coffee Break
|
|
Session II: Enabling Metrology for Integrating Components in Advanced Packaging
|
|
10:45-11:10
|
Advanced Imaging and Analysis at Nanoscale for Dimensional Nanometrology
|
Dr. Shengkai Yu, NMC/A*star
|
|
11:10-11:35
|
The Metrology Pillar of Semiconductor Advanced Packaging: Precision Measurement of Vertical Structures in 3D IC
|
Dr. Jen-Chieh Wang, OmniMeasure
|
|
11:35-12:00
|
Advance Package Failure Analysis and Challenge
|
Charles Lin, Zeiss
|
|
12:00-13:00
|
Lunch
|
|
Session III: Metrology for Materials Purity, Properties, and Provenance
|
|
13:00-13:25
|
Criticality of Integrated Microcontamination Control in Advanced Semiconductor Processes
|
Dr. Po-Chia Chen, Entegris
|
|
13:25-13:50
|
Material Property Characterization for Advanced EUV Lithography: Metrology Needs and Challenges
|
Dr. Ansoon Kim, KRISS
|
|
13:50-14:15
|
Future Prospects and Challenges of Chemical Analysis in Advanced Semiconductor Manufacturing Processes
|
Jones Hsu, BASF
|
|
14:15-14:40
|
Unveiling Material Secrets: Advanced Mass Spectrometry for Semiconductors Analysis
|
Erin Hsiung, Sr Application Chemist, Waters
|
|
14:40-15:00
|
Coffee Break
|
|
Session IV: Worldwide View of Semiconductor Metrology
|
|
15:00-15:20
|
Metrology Challenges for Emerging Semiconductors
|
Dr. Fernando Castro, NPL
|
|
15:20-15:35
|
TBD
|
Dr. Victoria Coleman, NMIA
|
|
15:35-15:50
|
Advanced Materials Science and Technology - Opportunities and Challenges for Thailand
|
Dr. Jariya Buajarern, NMIT
|
|
15:50-16:05
|
TBD
|
TBD, NMIM-SIRIM
|
|
16:05-16:20
|
Demand and Challenges in Electromagnetics Metrology for the Semiconductor Industry
|
Dr. Yusong Meng, NMC/A*star
|
|
16:20-16:35
|
TBD
|
Dr. Gonda Satoshi, NMIJ
|
|
16:35-17:00
|
Semiconductor Focus Group in APMP area
|
Dr. Wei-En Fu, CMS/ITRI
|
